13th International Conference on Fracture June 16–21, 2013, Beijing, China -6- Figure 3. Computational procedure for evaluation of the threshold current density Elec. Current j Cu : t = 410 [nm] L1 = 150 [μm] L2= 12.5 [μm]: Short 25.0 [μm]: Long - + j j L1 L2 L2 Sample 1 Sample 2 - + j j L1 L2 Sample 3 - + j j L1 W + - Via Elec. current j + - + - - + j j L1 L2 + - Sample 4 Figure 4. The dimension and structure of the supposed lines In this simulation, Cu line is assumed having characteristic constants listed in Table 2 [8]-[12]. We supposed three values of input current density, 0.2, 0.4 and 0.6 MA/cm2. The operating temperature is assumed 573K for all samples. The constants of the film characteristics Calculation of the AFD* gen|end and AFD* gen Two-dimensional FE analysis ・ Current density distribution ・ Temperature distribution Atomic density related to θ, N* Atomic density in each elements, N Yes No Reach the critical atomic density or steady state? Initial atomic density of the element = N0 End Repetitive calculation in each element
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